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All Facilities >> Northwestern University >> Pulsed Laser Deposition (PLD) Core Facility
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Northwestern University
2145 Sheridan Road
Room NG32
Evanston, IL 60208
United States of Americahttp://sites.northwestern.edu/pldcore/cite this facility
Bruce Buchholz
Last Updated: 11/06/2018
The Pulsed Laser Deposition (PLD) facility provides a means of growing thin film of metals and oxides ranging from a nanometer to a micron thick. The facility contains a state of the art PVD PLD/MBE 2300 with high pressure RHEED capabilities. Samples as large as 2” diameter, deposition temperatures as high as 850°C, and deposition pressures between 2x10-7 and 1 Torr with post deposition annealing as high as 300 Torr can be accommodated. The instrument holds multiple targets which allows the deposition of multilayers and superlattices. PLD also provides a convenient way to make thin films of materials heretofore studied in the bulk by pressing and sintering a target from the bulk material; facilities are available at Northwestern for the pressing and sintering of targets.
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https://coremarketplace.org/?FacilityID=746Keywords:
Grow, thin, film, metal, oxide, pulsed, laser, deposition, service, core, ABRF
Resource Type:
core facility, access service resource, service resource
Citation:
Northwestern University Pulsed Laser Deposition Core Facility (RRID:SCR_017889)
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