University of Massachusetts Lowell
Contact Info:
Justin Moreau
Saab Emerging Technologies & Innovation Center
40 University Ave
Lowell, MA 01854
https://www.uml.edu/research/crf/ourlabs/nanofab-lab.aspx
Grants and Identifiers:
RRID: RRID:SCR_024734
Instrumentation:
SUSS MicroTek MA6/BA6 Mask Aligner
MA/BA6 mask aligner is designed for all standard lithography applications and wafer sizes of up to 150 mm. For thick-resist MEMS applications, the MA/BA6 offers high resolution and optimum edge quality. The bottom side alignment option allows for pattern printing on both sides of the substrate. The MA/BA6 additionally provides tailored features for fragile III-V compounds, thinned or warped wafers, transparent substrates and pieces or single dies. [Product Link]
cite this instrument
FIJI Atomic Layer Deposition
ALD with Loadlock Capable of Plasma or Thermal ALD Substrate size: Up to 200mm Substrate Temperature: up to 500C Precursors Available: Al, Hf, Pt, Sio2, Nb, others on request Training is required before use
Services Provided:
Relevant Publications:
Description:
The Nanofabrication Lab features a state-of-the-art, 4,200 ft2 Class 100 clean room equipped with over 40 pieces of process and analytical instrumentation for complex research projects that require micro and nano scale fabrication.
