Colorado School of Mines
Contact Info:
Alex Dixon
golden, CO
https://www.mines.edu/shared-facilities/
Grants and Identifiers:
RRID: RRID:SCR_022047
Instrumentation:
SUSS MicroTek MA6/BA6 Mask Aligner
MA/BA6 mask aligner is designed for all standard lithography applications and wafer sizes of up to 150 mm. For thick-resist MEMS applications, the MA/BA6 offers high resolution and optimum edge quality. The bottom side alignment option allows for pattern printing on both sides of the substrate. The MA/BA6 additionally provides tailored features for fragile III-V compounds, thinned or warped wafers, transparent substrates and pieces or single dies. [Product Link]
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Services Provided:
Relevant Publications:
Description:
This facility houses cleanrooms with processing equipment for making and characterizing electronic devices, thin film deposition tools for the creation of metallic and ceramic thin film devices, and a characterization lab with tools for the surface, morphological, and optical characterization of materials.
